Prohaska O, Pacha F, Pfundner P, Petsche H
Electroencephalogr Clin Neurophysiol. 1979 Nov;47(5):629-31. doi: 10.1016/0013-4694(79)90267-0.
A 16-fold semi-microelectrode with 10 x 10 sq. microns contacts at distances of 150 microns, produced by means of thin-film technology, is described. These small dimensions are required to study the laminar electrophysiological differences within the cerebral cortex.
描述了一种通过薄膜技术制造的16倍半微电极,其具有10×10平方微米的触点,间距为150微米。这些小尺寸是研究大脑皮质内分层电生理差异所必需的。