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使用溅射技术在聚醚醚酮基底上制备羟基磷灰石薄膜。

Fabrication of hydroxyapatite thin films on polyetheretherketone substrates using a sputtering technique.

作者信息

Ozeki K, Masuzawa T, Aoki H

机构信息

Department of Mechanical Engineering, Ibaraki University, 4-12-1, Nakanarusawa, Hitachi, Ibaraki 316-8511, Japan.

Department of Mechanical Engineering, Ibaraki University, 4-12-1, Nakanarusawa, Hitachi, Ibaraki 316-8511, Japan.

出版信息

Mater Sci Eng C Mater Biol Appl. 2017 Mar 1;72:576-582. doi: 10.1016/j.msec.2016.11.111. Epub 2016 Dec 5.

Abstract

Hydroxyapatite (HA) thin films were coated on a polyetheretherketone (PEEK) substrate using a sputtering technique. A thin titanium (Ti) intermediate layer was formed between the HA and the PEEK surface to improve adhesion of the HA film to the PEEK substrate. The coated films were recrystallized using a hydrothermal treatment to reduce the dissolution of the HA film. The films were then characterized by X-ray diffractometry (XRD), scanning electron microscopy (SEM), and a UV-Vis spectrophotometer. A pull-out test was performed to measure the film-to-substrate adhesion strength, and an immersion test was performed in ultra-pure water. In the XRD patterns of the sputtered film with the Ti intermediate layer on the PEEK substrate, small HA peaks and large Ti peaks were observed. After the hydrothermal treatment, the intensity of the HA peaks increased. The transmittance of the HA films with 5 and 10nm Ti intermediate layers was >79% and 68%, respectively, in the visible light wavelength region (400-700nm) after the hydrothermal treatment. The adhesion strength of the hydrothermally treated HA films increased with decreasing thickness of the Ti intermediate layer, and the strength reached 2.7MPa with the 5-nm-thick Ti intermediate layer. In the immersion test, the HA film with a 5-nm-thick Ti intermediate layer without hydrothermal treatment exhibited a released Ti concentration of 42.0±2.4ppb. After hydrothermal treatment, the released Ti concentration decreased to 17.3±1.1ppb.

摘要

采用溅射技术在聚醚醚酮(PEEK)基底上涂覆羟基磷灰石(HA)薄膜。在HA和PEEK表面之间形成一层薄的钛(Ti)中间层,以提高HA薄膜与PEEK基底的附着力。对涂覆的薄膜进行水热处理使其再结晶,以减少HA薄膜的溶解。然后通过X射线衍射仪(XRD)、扫描电子显微镜(SEM)和紫外可见分光光度计对薄膜进行表征。进行拉伸试验以测量薄膜与基底的附着强度,并在超纯水中进行浸泡试验。在PEEK基底上带有Ti中间层的溅射薄膜的XRD图谱中,观察到小的HA峰和大的Ti峰。水热处理后,HA峰的强度增加。水热处理后,在可见光波长区域(400 - 700nm),带有5nm和10nm Ti中间层的HA薄膜的透光率分别>79%和68%。水热处理后的HA薄膜的附着强度随着Ti中间层厚度的减小而增加,当Ti中间层厚度为5nm时,强度达到2.7MPa。在浸泡试验中,未经水热处理的带有5nm厚Ti中间层的HA薄膜的Ti释放浓度为42.0±2.4ppb。水热处理后,Ti释放浓度降至17.3±1.1ppb。

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