Boulton S J, Jackson S P
Wellcome/CRC Institute, Tennis Court Road, Cambridge CB2 1QR, UK.
EMBO J. 1998 Mar 16;17(6):1819-28. doi: 10.1093/emboj/17.6.1819.
In the budding yeast, Saccharomyces cerevisiae, genes in close proximity to telomeres are subject to transcriptional silencing through the process of telomere position effect (TPE). Here, we show that the protein Ku, previously implicated in DNA double-strand break (DSB) repair and in telomeric length maintenance, is also essential for telomeric silencing. Furthermore, using an in vivo plasmid rejoining assay, we demonstrate that SIR2, SIR3 and SIR4, three genes shown previously to function in TPE, are essential for Ku-dependent DSB repair. As is the case for Ku-deficient strains, residual repair operating in the absence of the SIR gene products ensues through an error-prone DNA repair pathway that results in terminal deletions. To identify novel components of the Ku-associated DSB repair pathway, we have tested several other candidate genes for their involvement in DNA DSB repair, telomeric maintenance and TPE. We show that TEL1, a gene required for telomeric length maintenance, is not required for either DNA DSB repair or TPE. However, RAD50, MRE11 and XRS2 function both in Ku-dependent DNA DSB repair and in telomeric length maintenance, although they have no major effects on TPE. These data provide important insights into DNA DSB repair and the linkage of this process to telomere length homeostasis and transcriptional silencing.
在出芽酵母酿酒酵母中,靠近端粒的基因会通过端粒位置效应(TPE)过程受到转录沉默的影响。在此,我们表明,先前与DNA双链断裂(DSB)修复以及端粒长度维持有关的蛋白质Ku,对于端粒沉默也是必不可少的。此外,使用体内质粒重新连接试验,我们证明了先前显示在TPE中起作用的三个基因SIR2、SIR3和SIR4,对于Ku依赖性DSB修复是必不可少的。与Ku缺陷菌株的情况一样,在没有SIR基因产物的情况下进行的残留修复是通过易出错的DNA修复途径进行的,这会导致末端缺失。为了鉴定Ku相关DSB修复途径的新成分,我们测试了其他几个候选基因参与DNA DSB修复、端粒维持和TPE的情况。我们表明,端粒长度维持所需的基因TEL1对于DNA DSB修复或TPE均不是必需的。然而,RAD50、MRE11和XRS2在Ku依赖性DNA DSB修复和端粒长度维持中均起作用,尽管它们对TPE没有重大影响。这些数据为DNA DSB修复以及该过程与端粒长度稳态和转录沉默的联系提供了重要的见解。