Schottky-barrier height and electronic structure of the Si interface with metal silicides: CoSi2, NiSi2, and YSi2.
作者信息
Fujitani H, Asano S
出版信息
Phys Rev B Condens Matter. 1994 Sep 15;50(12):8681-8698. doi: 10.1103/physrevb.50.8681.
PMID:9974888
Abstract
摘要
Zotero 插件