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InGaN(0001)表面富铟纳米结构的自发形成。

Spontaneous formation of indium-rich nanostructures on InGaN(0001) surfaces.

作者信息

Chen H, Feenstra RM, Northrup JE, Zywietz T, Neugebauer J

机构信息

Department of Physics, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, USA.

出版信息

Phys Rev Lett. 2000 Aug 28;85(9):1902-5. doi: 10.1103/PhysRevLett.85.1902.

Abstract

InGaN(0001) surfaces prepared by molecular beam epitaxy have been studied using scanning tunneling microscopy and first-principles total energy calculations. Nanometer-size surface structures are observed consisting of either vacancy islands or ordered vacancy rows. The spontaneous formation of these structures is shown to be driven by significant strain in the surface layers and by the relative weakness of the In-N bond compared to Ga-N. Theory indicates that In will preferentially bind at the edges and interior of the structures, thereby giving rise to an inhomogeneous In distribution at the surface.

摘要

利用扫描隧道显微镜和第一性原理总能量计算方法,对通过分子束外延制备的InGaN(0001)表面进行了研究。观察到由空位岛或有序空位行组成的纳米级表面结构。结果表明,这些结构的自发形成是由表面层中的显著应变以及In-N键相对于Ga-N键的相对较弱所驱动的。理论表明,In将优先结合在结构的边缘和内部,从而在表面产生不均匀的In分布。

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