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一种用于皮层成像的新计算方法。

A new computational approach for cortical imaging.

作者信息

Ollikainen J O, Vauhkonen M, Karjalainen P A, Kaipio J P

机构信息

University of Kuopio, Department of Applied Physics, Finland.

出版信息

IEEE Trans Med Imaging. 2001 Apr;20(4):325-32. doi: 10.1109/42.921481.

Abstract

Estimation of current or potential distribution on the cortex is used to obtain information about neural sources from the scalp recorded electroencephalogram. If the active sources in the brain are superficial, the estimated field distribution on the cortex also yields information about the active source configuration. In these cases, these methods can be used as source localization methods. In this study, we concentrate on finite-element-based cortex potential estimation. Usually these methods require surface interpolation of the recorded voltages at the electrodes onto the entire scalp surface. We propose a new computational approach which does not require the use of surface interpolation but does it implicitly and uses only the recorded data at the electrodes. We refer to this method as the systematic approach (SA). We compare the SA with the surface interpolation approach (IA) and show that the SA is able to produce somewhat better accuracy than the IA. However, the main asset is that the sensitivity of the cortical potential maps to the regularization parameter is significantly lower than with the IA.

摘要

通过估计皮层上的电流或电位分布,可从头皮记录的脑电图中获取有关神经源的信息。如果大脑中的活跃源位于浅层,那么皮层上估计的场分布也能提供有关活跃源配置的信息。在这些情况下,这些方法可用作源定位方法。在本研究中,我们专注于基于有限元的皮层电位估计。通常,这些方法需要将电极处记录的电压在整个头皮表面进行表面插值。我们提出了一种新的计算方法,该方法不需要使用表面插值,而是隐式地进行插值,并且仅使用电极处的记录数据。我们将此方法称为系统方法(SA)。我们将SA与表面插值方法(IA)进行比较,结果表明SA能够产生比IA稍高的精度。然而,主要优点是皮层电位图对正则化参数的敏感性明显低于IA。

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