Konecny R, Leonard S, Shi X, Robinson V, Castranova V
National Institute for Occupational Safety and Health, Morgantown, WV 26505-2888, USA.
J Environ Pathol Toxicol Oncol. 2001;20 Suppl 1:119-32.
We studied the adsorption of hydroxyl radicals and superoxide anion radicals on a hydroxylated alpha-quartz surface using cluster and periodic slab models by means of density functional calculations. Models of two hydroxylated alpha-quartz surfaces--(0001) and (0111)--have been used in the simulations. The hydroxyl radical adsorbs readily on both surfaces. The subsurface Si-O bonds are weakened during the adsorption resulting in surface layer destabilization. This destabilization leads directly to surface disintegration in the case of OH/(0111) adsorption. The product of the surface disintegration and reconstruction is a surface terminated by silanol groups (Si-OH) and siloxyl radicals (Si-O). The model calculations suggest that adsorption of OH on a hydroxylated quartz surface transforms a chemically inert, aged, silanol terminated surface to a very reactive, silicon-based radical terminated surface. The activated surface may then cause oxidative damage to the adsorbed biomaterial. The superoxide anion radical adsorbs on both surfaces, but the adsorption products are only weakly bonded to the surface. The calculated energy barrier for the O2- activated subsurface Si-O bond dissociation is 10 kcal/mol, which is higher than for the *OH activated process (4 kcal/mol). The calculated weaker bonding to the surface and higher activation energy barrier suggest that the superoxide anion radical will be less efficient in reactivation of an aged, hydroxylated quartz surface than the hydroxyl radical. The importance of the specific geometry of the surface silicon atoms on the surface reactivity and adsorption properties is also discussed. The theoretical predictions are supported experimentally using chemiluminescence to monitor reactivation of the aged silica surface by superoxide anion radicals.
我们通过密度泛函计算,使用团簇模型和周期性平板模型研究了羟基自由基和超氧阴离子自由基在羟基化α-石英表面的吸附情况。模拟中使用了两种羟基化α-石英表面——(0001)和(0111)——的模型。羟基自由基在这两种表面上都易于吸附。吸附过程中,次表面的Si-O键被削弱,导致表面层不稳定。在OH/(0111)吸附的情况下,这种不稳定直接导致表面解体。表面解体和重构的产物是一个由硅醇基团(Si-OH)和硅氧基自由基(Si-O)终止的表面。模型计算表明,OH在羟基化石英表面的吸附将一个化学惰性的、老化的、由硅醇终止的表面转变为一个非常活泼的、由硅基自由基终止的表面。活化后的表面可能会对吸附的生物材料造成氧化损伤。超氧阴离子自由基在这两种表面上都能吸附,但吸附产物与表面的结合较弱。计算得出,O2活化次表面Si-O键解离的能垒为10千卡/摩尔,高于*OH活化过程的能垒(4千卡/摩尔)。计算得出的与表面较弱的结合以及较高的活化能垒表明,超氧阴离子自由基在使老化的羟基化石英表面再活化方面的效率低于羟基自由基。还讨论了表面硅原子的特定几何结构对表面反应性和吸附性能的重要性。通过化学发光监测超氧阴离子自由基对老化二氧化硅表面的再活化,实验结果支持了理论预测。