Collins Patrick J, Daglish Gregory J, Bengston Mervyn, Lambkin Tina M, Pavic Hervoika
Queensland Department of Primary Industries, Indooroopilly, Australia.
J Econ Entomol. 2002 Aug;95(4):862-9. doi: 10.1603/0022-0493-95.4.862.
The inheritance of resistance to phosphine was studied in two strains of the lesser grain borer, Rhyzopertha dominica (F.), labeled 'Weak-R' and 'Strong-R'. These strains were purified versions of field-selected populations collected in Queensland, Australia. Weak-R and Strong-R were, respectively, 23.4 times (20-h exposure) and 600 times (48-h exposure) resistant to phosphine compared with a reference susceptible strain (S-strain). Each -R strain was crossed with the S-strain and the response to phosphine was measured in their respective F1, F2, and F1-backcross (F1-BC) progenies. Data from testing of reciprocal F1 progeny indicated that resistance in Weak-R was autosomal and incompletely recessive with a degree of dominance -0.96. Modified chi-square analysis and contingency analysis of the observed response to phosphine of F1-BC and F2 progenies rejected the hypothesis of single gene inheritance of resistance. Analysis of the response of the F1, F2, and F1-BC progeny from the Strong-R x S-strain cross also rejected the null hypothesis for single gene resistance. Resistance in the Strong-R strain was autosomal and incompletely recessive with a degree of dominance of -0.64. The Weak-R and Strong-R strains were then crossed. Analysis ofthe F1 and F2 progenies of this reciprocal cross revealed that the strong resistance phenotype was coded by a combination of the genes already present in the Weak-R genotype plus an extra major, incompletely recessive gene. There was also evidence of a minor dominant gene present in approximately 5% of Strong-R individuals.
对谷蠹(Rhyzopertha dominica (F.))的两个品系“弱抗-R”和“强抗-R”进行了抗磷化氢遗传研究。这两个品系是从澳大利亚昆士兰州田间选择的群体的纯化版本。与参考敏感品系(S品系)相比,“弱抗-R”和“强抗-R”对磷化氢的抗性分别为23.4倍(20小时暴露)和600倍(48小时暴露)。每个-R品系与S品系杂交,并在其各自的F1、F2和F1回交(F1-BC)后代中测量对磷化氢的反应。正反交F1后代的测试数据表明,“弱抗-R”中的抗性是常染色体遗传且不完全隐性,显性度为-0.96。对F1-BC和F2后代对磷化氢的观察反应进行的修正卡方分析和列联分析拒绝了抗性单基因遗传的假设。对“强抗-R”×S品系杂交的F1、F2和F1-BC后代的反应分析也拒绝了单基因抗性的零假设。“强抗-R”品系中的抗性是常染色体遗传且不完全隐性,显性度为-0.64。然后将“弱抗-R”和“强抗-R”品系杂交。对这个正反交杂交的F1和F2后代的分析表明,强抗性表型由“弱抗-R”基因型中已有的基因组合加上一个额外的主要不完全隐性基因编码。也有证据表明,约5%的“强抗-R”个体中存在一个次要显性基因。