Warren R, Rogolsky M, Wiley B B, Glasgow L A
J Bacteriol. 1975 Apr;122(1):99-105. doi: 10.1128/jb.122.1.99-105.1975.
The ability of phage group II staphylococcal strain UT 0101 to produce exfoliative toxin and bacteriocin could be eliminated at a high frequency after growth at high temperatures or in the presence of ethidium bromide or sodium dodecyl sulfate. Extrachromosomal deoxyribonucleic acid, associated with the genes for exfoliative toxin and bacteriocin production, was isolated from strain UT 0101 but was absent from an ethidium bromide-cured substrain. The molecular weight of the exfoliative toxin plasmid, determined by co-sedimentation with the penicillinase plasmid, PI258, was 3.3 times 10-7. The 56S covalently closed circular form of the exfoliative toxin plasmid converted to a 38S open circular form after storage or exposure to sodium dodecyl sulfate. Plasmid deoxyribonucleic acid associated with penicillin resistance could not be identified in the penicillin-resistance Tox+ strains, UT 0007 and UT 0001.
II 组噬菌体葡萄球菌菌株 UT 0101 产生剥脱毒素和细菌素的能力，在高温下生长或在溴化乙锭或十二烷基硫酸钠存在的情况下，能够以高频率被消除。从菌株 UT 0101 中分离出了与剥脱毒素和细菌素产生基因相关的染色体外脱氧核糖核酸，但在溴化乙锭处理过的亚菌株中不存在。通过与青霉素酶质粒 PI258 共沉降测定，剥脱毒素质粒的分子量为 3.3×10⁻⁷。剥脱毒素质粒的 56S 共价闭合环状形式在储存或暴露于十二烷基硫酸钠后转变为 38S 开环形式。在青霉素抗性 Tox⁺菌株 UT 0007 和 UT 0001 中未鉴定出与青霉素抗性相关的质粒脱氧核糖核酸。
