Petrik Nikolay G, Kimmel Greg A
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Mail Stop K8-88, P.O. Box 999, Richland, Washington 99352, USA.
Phys Rev Lett. 2003 Apr 25;90(16):166102. doi: 10.1103/PhysRevLett.90.166102.
The electron-stimulated production of D2 from amorphous solid D2O deposited on Pt(111) is investigated as a function of film thickness. The D2 yield has two components that have distinct reaction kinetics. Using isotopically layered films of H2O and D2O demonstrates that the D2 is produced in reactions that occur at both the Pt/amorphous solid water (ASW) interface and the ASW/vacuum interface, but not in the bulk. The energy for the reactions, however, is absorbed in the bulk of the films and electronic excitations diffuse to the interfaces where they drive the reactions.
研究了沉积在Pt(111)上的非晶态固体D2O受电子激发产生D2的过程与薄膜厚度的关系。D2产率有两个具有不同反应动力学的组分。使用H2O和D2O的同位素分层薄膜表明,D2是在Pt/非晶态固体水(ASW)界面和ASW/真空界面发生的反应中产生的,但不是在体相中产生的。然而,反应能量被薄膜体相吸收,电子激发扩散到界面,在那里驱动反应。