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Emissivity modeling of metals during the growth of oxide film and comparison of the model with experimental results.

作者信息

Iuchi Tohru, Furukawa Tohru, Wada Shigenobu

机构信息

Department of Mechanical Engineering, Toyo University, 2100 Kujirai Kawagoe, Saitama 3508585, Japan.

出版信息

Appl Opt. 2003 May 1;42(13):2317-26. doi: 10.1364/ao.42.002317.

Abstract

Emissivity modeling of metals has been developed to elucidate behavior during the growth of oxide film, and the modeling results have been compared with experimental results. To express emissivities, pseudo-optical constants of a bare metal and of an oxide film obtained by an elipsometer are substituted into the model equations. Emissivity behavior during the growth of an oxide film upon the surface of a specimen is shown in terms of spectral, directional, and polarized characteristics, and it coincides with the experimental results, both quantitatively and qualitatively. The modeling is simple and provides useful guidance for the development of emissivity-compensated radiation thermometry.

摘要

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