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硅诱导高粱根细胞壁粘弹性特性的变化。

Silicon-induced changes in viscoelastic properties of sorghum root cell walls.

作者信息

Hattori Taiichiro, Inanaga Shinobu, Tanimoto Eiichi, Lux Alexander, Luxová Miroslava, Sugimoto Yukihiro

机构信息

Arid Land Research Center, Tottori University, 1390 Hamasaka, Tottori, 680-0001 Japan.

出版信息

Plant Cell Physiol. 2003 Jul;44(7):743-9. doi: 10.1093/pcp/pcg090.

Abstract

Silicon is deposited in the endodermal tissue in sorghum (Sorghum bicolor L. Moench) roots. Its deposition is thought to protect vascular tissues in the stele against invasion by parasites and drying soil via hardening of endodermal cells. We studied the silicon-induced changes in mechanical properties of cell walls to clarify the role of silicon in sorghum root. Sorghum seedlings were grown in nutrient solution with or without silicon. The mechanical properties of cell walls were measured in three separated root zones: basal, apical and subapical. Silicon treatment decreased cell-wall extensibility in the basal zone of isolated stele tissues covered by endodermal inner tangential walls. The silicon-induced hardening of cell walls was also measured with increases in elastic moduli (E) and viscosity coefficients (eta). These results provided new evidence that silicon deposition might protect the stele as a mechanical barrier by hardening the cell walls of stele and endodermal tissues. In contrast to the basal zone, silicon treatment increased cell-wall extensibility in the apical and subapical zones with concomitant decrease in E and eta. Simultaneously, silicon promoted root elongation. When root elongation is promoted by silicon, one of the causal factors maybe the silicon-enhanced extensibility of cell walls in the growing zone.

摘要

硅沉积在高粱(Sorghum bicolor L. Moench)根的内皮层组织中。其沉积被认为可通过内皮层细胞的硬化来保护中柱中的维管组织免受寄生虫侵袭和干燥土壤的影响。我们研究了硅诱导的细胞壁力学性能变化,以阐明硅在高粱根中的作用。高粱幼苗在含硅或不含硅的营养液中生长。在三个不同的根区:基部、顶端和亚顶端测量细胞壁的力学性能。硅处理降低了被内皮层内切向壁覆盖的分离中柱组织基部区域细胞壁的伸展性。还通过弹性模量(E)和粘度系数(η)的增加来测量硅诱导的细胞壁硬化。这些结果提供了新的证据,表明硅沉积可能通过硬化中柱和内皮层组织的细胞壁作为机械屏障来保护中柱。与基部区域相反,硅处理增加了顶端和亚顶端区域细胞壁的伸展性,同时E和η降低。同时,硅促进根的伸长。当硅促进根伸长时,其中一个因果因素可能是硅增强了生长区细胞壁的伸展性。

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