Baker P A, Catledge S A, Vohra Y K
Physics Department, University of Alabama at Birmingham, Birmingham, Alabama 35294-1170, USA.
J Nanosci Nanotechnol. 2001 Mar;1(1):31-4. doi: 10.1166/jnn.2001.007.
Nanostructured diamond films are grown on a titanium alloy substrate using a two-step deposition process. The first step is performed at elevated temperature (820 degrees C) for 30 min using a H2/CH4/N2 gas mixture to grow a thin (approximately 600 nm) nanostructured diamond layer and to improve film adhesion. The remainder of the deposition involves growth at low temperature (< 600 degrees C) in a H2/CH4/O2 gas mixture. The continuation of the smooth nanostructured diamond film growth during low-temperature deposition is confirmed by in situ laser reflectance interferometry, atomic force microscopy, micro-Raman spectroscopy, and surface profilometry. Similar experiments performed without the initial nanostructured diamond layer resulted in poorly adhered films with a more crystalline appearance and a higher surface roughness. This low-temperature deposition of nanostructured diamond films on metals offers advantages in cases where high residual thermal stress leads to delamination at high temperatures.
采用两步沉积工艺在钛合金基底上生长纳米结构金刚石薄膜。第一步在高温（820摄氏度）下使用H2/CH4/N2气体混合物进行30分钟，以生长一层薄的（约600纳米）纳米结构金刚石层并改善薄膜附着力。沉积的其余部分涉及在低温（<600摄氏度）下于H2/CH4/O2气体混合物中生长。通过原位激光反射干涉测量、原子力显微镜、显微拉曼光谱和表面轮廓测量法证实了低温沉积过程中光滑纳米结构金刚石薄膜的持续生长。在没有初始纳米结构金刚石层的情况下进行的类似实验导致薄膜附着力差，外观更结晶且表面粗糙度更高。在高残余热应力导致高温下分层的情况下，这种在金属上低温沉积纳米结构金刚石薄膜具有优势。
