Sharda T, Soga T, Jimbo T, Umeno M
Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466 8555, Japan.
J Nanosci Nanotechnol. 2001 Sep;1(3):287-90. doi: 10.1166/jnn.2001.043.
The thermal stability of nanocrystalline diamond (NCD) films grown on mirror-polished silicon substrates by biased enhanced microwave plasma chemical vapor deposition was investigated. Different pieces of a NCD sample were annealed for 1 h in an ambient argon atmosphere at 200, 400, 600, and 800 degrees C. The structural and mechanical properties of as-grown and annealed samples were assessed. The surface roughness and high hardness of the samples remained fairly constant with annealing temperature.
研究了通过偏置增强微波等离子体化学气相沉积在镜面抛光硅衬底上生长的纳米晶金刚石（NCD）薄膜的热稳定性。将一块NCD样品的不同部分在氩气环境中于200、400、600和800摄氏度下退火1小时。评估了生长态和退火后样品的结构和力学性能。样品的表面粗糙度和高硬度随退火温度保持相当恒定。
