Chen Q, Dai L
CSIRO Molecular Science, Bag 10, Clayton South, Victoria 3169, Australia.
J Nanosci Nanotechnol. 2001 Mar;1(1):43-7. doi: 10.1166/jnn.2001.003.
Three-dimensional micropatterns of well-aligned carbon nanotubes were prepared on photolithographically prepatterned substrates by pyrolysis of iron(II) phthalocyanine (FePc) under an Ar/H2 atmosphere at 800-1100 degrees C. The photopatterning was achieved by photolithographic cross-linking of a chemically amplified photoresist layer spin-cast on a quartz plate or a silicon wafer, coupled with solution development. Owing to an appropriate surface characteristic, the patterned photoresist layer was found in this case to support aligned carbon nanotube growth by pyrolysis of FePc, as were the photoresist-free substrate surfaces. The difference in chemical nature between the surface areas covered and uncovered by the photoresist film, however, caused a region-specific growth of the nanotubes with different tubular lengths and packing densities, leading to the formation of three-dimensional aligned nanotube patterns suitable for various device applications.
通过在800 - 1100摄氏度的氩气/氢气气氛下热解铁（II）酞菁（FePc），在光刻预图案化的基板上制备了排列良好的碳纳米管三维微图案。光刻图案化是通过对旋涂在石英板或硅片上的化学放大光刻胶层进行光刻交联，并结合溶液显影来实现的。由于具有合适的表面特性，在这种情况下发现图案化的光刻胶层以及无光刻胶的基板表面都能通过FePc热解来支持排列的碳纳米管生长。然而，光刻胶膜覆盖和未覆盖的表面积之间的化学性质差异导致了具有不同管长和堆积密度的纳米管的区域特异性生长，从而形成了适用于各种器件应用的三维排列纳米管图案。
