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高分辨率扫描电子显微镜

High-resolution scanning electron microscopy.

作者信息

Joy D C, Pawley J B

机构信息

EM Facility, University of Tennessee, Knoxville 37996-0810.

出版信息

Ultramicroscopy. 1992 Nov;47(1-3):80-100. doi: 10.1016/0304-3991(92)90186-n.

Abstract

The spatial resolution of the scanning electron microscope is limited by at least three factors: the diameter of the electron probe, the size and shape of the beam/specimen interaction volume with the solid for the mode of imaging employed and the Poisson statistics of the detected signal. Any practical consideration of the high-resolution performance of the SEM must therefore also involve a knowledge of the contrast available from the signal producing the image and the radiation sensitivity of the specimen. With state-of-the-art electron optics, resolutions of the order of 1 nm are now possible. The optimum conditions for achieving such performance with the minimum radiation damage to the specimen correspond to beam energies in the range 1-3 keV. Progress beyond this level may be restricted by the delocalization of SE production and ultimate limits to electron-optical performance.

摘要

扫描电子显微镜的空间分辨率至少受三个因素限制

电子探针的直径、所采用成像模式下电子束与固体样品相互作用体积的大小和形状,以及检测信号的泊松统计特性。因此,对扫描电子显微镜高分辨率性能的任何实际考量还必须包括对产生图像的信号的对比度以及样品的辐射敏感性的了解。借助最先进的电子光学技术,现在有可能实现约1纳米的分辨率。在对样品造成最小辐射损伤的情况下实现这种性能的最佳条件对应于1 - 3千电子伏特范围内的束流能量。超越这一水平的进展可能会受到二次电子产生的离域化以及电子光学性能的最终限制。

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