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表面成像中双线对比的观察

Observation of double line contrast in surface imaging.

作者信息

Yao N, Cowley J M

机构信息

Department of Physics, Arizona State University, Tempe 85287-1504.

出版信息

Microsc Res Tech. 1992 Feb 15;20(4):413-25. doi: 10.1002/jemt.1070200411.

Abstract

The double line contrast of a single-atom height step observed in surface imaging for a single crystal in reflection electron microscopy is studied under a variety of experimental conditions. It is suggested that this abnormal contrast is directly associated with the dynamical electron diffraction process. The behavior of the double line contrast is closely related to the order of the Bragg reflected beam, and can be observed mostly under one of the two commonly cited resonance conditions. This phenomenon clearly reveals the differences in the surface imaging for various resonance conditions.

摘要

在多种实验条件下,研究了反射电子显微镜中对单晶进行表面成像时观察到的单原子高度台阶的双线对比度。结果表明,这种异常对比度与动态电子衍射过程直接相关。双线对比度的行为与布拉格反射束的顺序密切相关,并且大多可以在两种常见的共振条件之一中观察到。这一现象清楚地揭示了各种共振条件下表面成像的差异。

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