Bubert H, Grallath E, Quentmeier A, Wielunski M, Borucki L
Institut für Spektrochemie und angewandte Spektroskopie (ISAS), Bunsen-Kirchhoff-Strasse 11, D-44139, Dortmund, Germany.
Anal Bioanal Chem. 1995 Oct;353(3-4):456-63. doi: 10.1007/s0021653530456.
Depth profiling has been performed by using X-ray photoelectron spectrometry (XPS) in combination with Ar-ion sputtering, Rutherford backscattering spectrometry (RBS) and glow discharge optical emission spectrometry (GDOES). The data obtained by XPS have been subjected to factor analysis in order to determine the compositional layering of the copper oxides. This leads to two or three relevant components within the oxide layers consisting of Cu(2)O or CuO dependent on the sample preparation. GDOES measurements show sputtering profiles which are seriously influenced by a varying sputter rate. To ensure the results obtained so far, RBS measurements of the oxide layers have been carried out in order to discover artefacts of the other methods used and to demonstrate the excellent suitability of RBS for quantitative analysis of these layers. Chemical analysis consisting of (1) carrier-gas fusion analysis (CGFA) and (2) selective dissolution of Cu(2)O/CuO allows the determination of the total amount of oxygen and copper, respectively, and can serve as a cornerstone of quantitative analysis.
通过结合氩离子溅射、卢瑟福背散射光谱法（RBS）和辉光放电光发射光谱法（GDOES）使用X射线光电子能谱法（XPS）进行深度剖析。对XPS获得的数据进行因子分析，以确定氧化铜的组成分层。根据样品制备情况，这会在由Cu₂O或CuO组成的氧化层中产生两个或三个相关成分。GDOES测量显示溅射轮廓受到变化的溅射速率严重影响。为确保到目前为止获得的结果，已对氧化层进行RBS测量，以发现所使用的其他方法的假象，并证明RBS对这些层进行定量分析的卓越适用性。由（1）载气熔融分析（CGFA）和（2）Cu₂O/CuO的选择性溶解组成的化学分析分别可以测定氧和铜的总量，并可作为定量分析的基石。
