Ignatova Velislava A, Van Den Berghe Sven, Van Dyck Steven, Popok Vladimir N
SCK CEN Reactor Materials Research (LHMA), Boeretang 200, 2400 Mol, Belgium.
Microsc Microanal. 2006 Oct;12(5):432-7. doi: 10.1017/S143192760606048X.
The oxide scales of AISI 304 formed in boric acid solutions at 300 degrees C and pH = 4.5 have been studied using X-ray photoelectron spectroscopy (XPS) depth profiling. The present focus is depth profile quantification both in depth and chemical composition on a molecular level. The roughness of the samples is studied by atomic force microscopy before and after sputtering, and the erosion rate is determined by measuring the crater depth with a surface profilometer and vertical scanning interferometry. The resulting roughness (20-30 nm), being an order of magnitude lower than the crater depth (0.2-0.5 microm), allows layer-by-layer profiling, although the ion-induced effects result in an uncertainty of the depth calibration of a factor of 2. The XPS spectrum deconvolution and data evaluation applying target factor analysis allows chemical speciation on a molecular level. The elemental distribution as a function of the sputtering time is obtained, and the formation of two layers is observed-one hydroxide (mainly iron-nickel based) on top and a second one deeper, mainly consisting of iron-chromium oxides.
利用X射线光电子能谱(XPS)深度剖析技术研究了AISI 304在300℃、pH = 4.5的硼酸溶液中形成的氧化皮。目前的重点是在分子水平上对深度和化学成分进行深度剖析定量分析。通过原子力显微镜研究溅射前后样品的粗糙度,并通过表面轮廓仪和垂直扫描干涉仪测量坑深来确定侵蚀速率。所得粗糙度(20 - 30纳米)比坑深(0.2 - 0.5微米)低一个数量级,这使得可以进行逐层剖析,尽管离子诱导效应导致深度校准存在2倍的不确定性。应用目标因子分析的XPS谱去卷积和数据评估能够在分子水平上进行化学形态分析。获得了元素分布随溅射时间的变化情况,并观察到形成了两层——顶部一层为氢氧化物(主要基于铁 - 镍),更深的第二层主要由铁 - 铬氧化物组成。