Windt David L, Donguy Soizik, Seely John, Kjornrattanawanich Benjawan
Columbia Astrophysics Laboratory, 550 West 120th Street, New York, New York 10027, USA.
Appl Opt. 2004 Mar 20;43(9):1835-48. doi: 10.1364/ao.43.001835.
We compare the reflectance and stability of multilayers comprising either Si/Mo, Si/Mo2C, Si/B4C, Si/C, or Si/SiC bilayers, designed for use as extreme-ultraviolet (EUV) reflective coatings. The films were deposited by using magnetron sputtering and characterized by both x-ray and EUV reflectometry. We find that the new Si/SiC multilayer offers the greatest spectral selectivity at the longer wavelengths, as well as the greatest thermal stability. We also describe the optimization of multilayers designed for the Solar-B EIS instrument. Finally, we compare experimental reflectance data with calculations and conclude that currently available optical constants cannot be used to adequately model the performance of many of these multilayers.
我们比较了由Si/Mo、Si/Mo₂C、Si/B₄C、Si/C或Si/SiC双层组成的多层膜的反射率和稳定性,这些多层膜被设计用作极紫外(EUV)反射涂层。通过磁控溅射沉积这些薄膜,并使用X射线和EUV反射测量对其进行表征。我们发现,新型Si/SiC多层膜在较长波长下具有最大的光谱选择性以及最大的热稳定性。我们还描述了为太阳B日地关系天文台(Solar-B)极紫外成像光谱仪(EIS)设计的多层膜的优化。最后,我们将实验反射率数据与计算结果进行比较,并得出结论:目前可用的光学常数无法充分模拟许多此类多层膜的性能。