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自组装硅烷单分子层:具有纳米级均匀性的制备方法。

Self-assembled silane monolayers: fabrication with nanoscale uniformity.

作者信息

Wang Mingji, Liechti Kenneth M, Wang Qi, White J M

机构信息

Center for Mechanics of Solids, Structures and Materials, Department of Aerospace Engineering and Engineering Mechanics, University of Texas at Austin, Austin, Texas 78712, USA.

出版信息

Langmuir. 2005 Mar 1;21(5):1848-57. doi: 10.1021/la048483y.

DOI:10.1021/la048483y
PMID:15723481
Abstract

Illustrating direct connections between surface chemical events and mechanical and topological characteristics of self-assembled monolayers derived from octadecyltrichlorosilane (OTS) adsorption on Si(100), layers prepared in the presence and absence of moisture have been characterized. Uniform and robust self-assembled monolayers are demonstrated provided the Si(100) surface is fully hydroxylated by treatment in piranha solution and the dried surface is exposed to OTS under strict anhydrous conditions. With nanoscale resolution, the uniform mechanical properties are confirmed by interfacial force microscopy while the uniform topological properties are evident in atomic force microscopy images. The monolayer character of the OTS coverage is confirmed by X-ray photoelectron spectroscopy, ellipsometry, and patterning experiments. Analogous surfaces, prepared in the presence of moisture, exhibit nonuniform topological and mechanical properties.

摘要

通过对在有无水分条件下制备的、由十八烷基三氯硅烷(OTS)吸附在Si(100)上形成的自组装单分子层进行表征,展示了表面化学事件与自组装单分子层的机械和拓扑特性之间的直接联系。如果Si(100)表面通过在过硫酸溶液中处理而完全羟基化,并且干燥后的表面在严格无水条件下暴露于OTS,则可得到均匀且坚固的自组装单分子层。利用纳米级分辨率,通过界面力显微镜确认了均匀的机械性能,而原子力显微镜图像中则明显显示出均匀的拓扑性能。通过X射线光电子能谱、椭偏仪和图案化实验证实了OTS覆盖的单分子层特性。在有水分存在的情况下制备的类似表面表现出不均匀的拓扑和机械性能。

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