Menozzi Claudia, Carlo Gazzadi Gian, Alessandrini Andrea, Facci Paolo
INFM National Research Center S3, Via Campi 213/A, 41100 Modena, Italy.
Ultramicroscopy. 2005 Oct;104(3-4):220-5. doi: 10.1016/j.ultramic.2005.04.004.
Nanomachining and beam-assisted Pt deposition by a focused ion beam (FIB) was used to modify AFM probes for improved electric force measurements. Si(3)N(4) cantilevers have been endowed with a nano-electrode at the tip apex to confine the electro-sensitive area at the very tip. This action results in both a marked decrease of the parasitic capacitive effect and in an improved electric force microscopy (EFM) contrast and resolution, with respect to usual, full metal-coated cantilevers. This fabrication approach is suited to the development of innovative electro-sensitive probes, useful in different scanning probe techniques.
利用聚焦离子束（FIB）进行纳米加工和束辅助铂沉积，对原子力显微镜（AFM）探针进行改性，以改进电力测量。已在Si₃N₄悬臂梁的尖端赋予纳米电极，将电敏感区域限制在非常小的尖端处。相对于通常的全金属涂层悬臂梁，这种做法既显著降低了寄生电容效应，又提高了电场力显微镜（EFM）的对比度和分辨率。这种制造方法适用于开发创新型电敏感探针，可用于不同的扫描探针技术。
