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用于高频表面声波器件的金刚石上AlN压电薄膜的生长

Growth of A1N piezoelectric film on diamond for high-frequency surface acoustic wave devices.

作者信息

Benetti Massimiliano, Cannatà Domenico, Di Pietrantonio Fabio, Verona Enrico

机构信息

Istituto di Acustica O. M. Corbino, CNR, Via del Fosso del Cavaliere, 100 I-00133 Rome, Italy.

出版信息

IEEE Trans Ultrason Ferroelectr Freq Control. 2005 Oct;52(10):1806-11. doi: 10.1109/tuffc.2005.1561635.

Abstract

Diamond films are very desirable for application to SAW devices because of their high acoustic wave velocity, which allows the extending of the frequency limit of operation at a given interdigital transducer line-width resolution. Use of high-quality AIN as the piezoelectric layer in conjunction with diamond is also desirable because of its high SAW velocity--the highest among all piezoelectric materials--together with its excellent electrical, mechanical, and chemical properties. The problems arising in the growth of A1N films on diamond have prevented, until now, the use of this combination of materials. In this paper we present recent results on the growth of highly oriented, low-stressed A1N films on diamond. SAW propagation on A1N/diamond has been theoretically investigated together with electromechanical coupling for both the Rayleigh and the Sezawa modes. The theoretical calculations show that high SAW velocities are achievable with good coupling efficiencies. Under proper conditions very large piezoelectric couplings are predicted--k2 = 2.2 and 4% for the Rayleigh and the Sezawa wave, respectively--comparable to those observed in strongly piezoelectric single crystals such as LiNbO3, but with SAW velocities approximately two-fold higher. Experiments performed on A1N/diamond/Si SAW test devices have shown good agreement between experimental results and theoretical predictions and demonstrate the feasibility of SAW devices based on this technology.

摘要

由于金刚石薄膜具有高声速,在给定叉指换能器线宽分辨率下能够扩展工作频率极限,因此非常适合应用于声表面波(SAW)器件。将高质量的氮化铝(AIN)作为压电层与金刚石结合使用也很理想,因为其声表面波速度很高(在所有压电材料中最高),同时还具有优异的电学、力学和化学性能。迄今为止,在金刚石上生长氮化铝薄膜时出现的问题阻碍了这种材料组合的应用。在本文中,我们展示了在金刚石上生长高度取向、低应力氮化铝薄膜的最新成果。我们从理论上研究了声表面波在氮化铝/金刚石上的传播以及瑞利模式和泽瓦模式的机电耦合。理论计算表明,可以实现高声表面波速度以及良好的耦合效率。在适当条件下,预计会有非常大的压电耦合——瑞利波和泽瓦波的k²分别为2.2%和4%——与在强压电单晶(如铌酸锂)中观察到的相当,但声表面波速度大约高出两倍。在氮化铝/金刚石/硅声表面波测试器件上进行的实验表明,实验结果与理论预测吻合良好,证明了基于该技术的声表面波器件的可行性。

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