Tulumello David, Cooper Glyn, Koprinarov Ivo, Hitchcock Adam P, Rightor Edward G, Mitchell Gary E, Rozeveld Steve, Meyers Greg F, Stokich Ted M
Department of Chemistry, McMaster University, Hamilton, Ontario L8S 4M1, Canada.
J Phys Chem B. 2005 Apr 7;109(13):6343-54. doi: 10.1021/jp050201v.
The C 1s, Si 2p, Si 2s, and O 1s inner-shell excitation spectra of vinyltriethoxysilane, trimethylethoxysilane, and vinyltriacetoxysilane have been recorded by electron energy loss spectroscopy under scattering conditions dominated by electric dipole transitions. The spectra are converted to absolute optical oscillator strength scales and interpreted with the aid of ab initio calculations of the inner-shell excitation spectra of model compounds. Electron energy loss spectra recorded in a transmission electron microscope on partly cured adhesion promoter, atomic force micrographs, and images and X-ray absorption spectra from X-ray photoemission electron microscopy of as-spun and cured vinyltriacetoxysilane-based adhesion promoter films on silicon are presented. The use of these measurements in assisting chemistry studies of adhesion promoters for electronics applications is discussed.
通过电子能量损失光谱法,在以电偶极跃迁为主导的散射条件下,记录了乙烯基三乙氧基硅烷、三甲基乙氧基硅烷和乙烯基三乙酰氧基硅烷的C 1s、Si 2p、Si 2s和O 1s内壳层激发光谱。这些光谱被转换为绝对光学振子强度标度,并借助模型化合物内壳层激发光谱的从头算进行解释。展示了在透射电子显微镜中记录的部分固化粘合促进剂的电子能量损失光谱、原子力显微镜图像,以及来自X射线光电子显微镜的硅上初纺和固化的基于乙烯基三乙酰氧基硅烷的粘合促进剂薄膜的图像和X射线吸收光谱。讨论了这些测量在辅助电子应用粘合促进剂化学研究中的用途。