通过快速重离子辐照合成纳米晶氧化锡薄膜。

Synthesis of nanocrystalline tin oxide thin film by swift heavy ion irradiation.

作者信息

Mohanty T, Satyam P V, Kanjilal D

机构信息

Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India.

出版信息

J Nanosci Nanotechnol. 2006 Aug;6(8):2554-9. doi: 10.1166/jnn.2006.532.

DOI:10.1166/jnn.2006.532

PMID:17037871

Abstract

Nanocrystals of tin oxide were formed in e-beam evaporated films by swift heavy ion (SHI) irradiation. The nucleation of nanocrystals occurred due to electronic excitation by swift heavy ion. Nanophase thin films are characterized systematically by HRTEM, GAXRD, EDX, and UV/NIS absorption techniques. Nanocrystals having size of 8 nm radius are synthesized in different substrates during swift heavy ion irradiation and without subsequent annealing. SHI induced nanocrystallization could be achieved in both crystalline and non-crystalline substrates.

摘要

通过快速重离子（SHI）辐照，在电子束蒸发薄膜中形成了氧化锡纳米晶体。纳米晶体的成核是由于快速重离子的电子激发所致。利用高分辨率透射电子显微镜（HRTEM）、掠角X射线衍射（GAXRD）、能谱仪（EDX）和紫外/近红外吸收技术对纳米相薄膜进行了系统表征。在快速重离子辐照过程中，在不同衬底上合成了半径为8 nm的纳米晶体，且无需后续退火处理。在晶体和非晶体衬底上均可实现SHI诱导的纳米晶化。