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透明导电氧化物的可掺杂性、本征导电性和非化学计量比。

Dopability, intrinsic conductivity, and nonstoichiometry of transparent conducting oxides.

作者信息

Lany Stephan, Zunger Alex

机构信息

National Renewable Energy Laboratory, Golden, Colorado 80401, USA.

出版信息

Phys Rev Lett. 2007 Jan 26;98(4):045501. doi: 10.1103/PhysRevLett.98.045501. Epub 2007 Jan 23.

Abstract

Existing defect models for In(2)O(3) and ZnO are inconclusive about the origin of conductivity, nonstoichiometry, and coloration. We apply systematic corrections to first-principles calculated formation energies Delta H, and validate our theoretical defect model against measured defect and carrier densities. We find that (i) intrinsic acceptors ("electron killers") have a high Delta H explaining high n-dopability, (ii) intrinsic donors ("electron producers") have either a high Delta H or deep levels, and do not cause equilibrium-stable conductivity, (iii) the O vacancy V(O) has a low Delta H leading to O deficiency, and (iv) V(O) has a metastable shallow state, explaining the paradoxical coexistence of coloration and conductivity.

摘要

现有的氧化铟(In₂O₃)和氧化锌(ZnO)缺陷模型对于其导电性、非化学计量比和着色的起源尚无定论。我们对第一性原理计算的形成能ΔH进行了系统校正,并根据测量的缺陷和载流子密度验证了我们的理论缺陷模型。我们发现:(i)本征受主(“电子杀手”)具有较高的ΔH,这解释了高n型掺杂能力;(ii)本征施主(“电子产生者”)要么具有较高的ΔH,要么具有深能级,且不会导致平衡稳定的导电性;(iii)氧空位V(O)具有较低的ΔH,导致氧缺乏;(iv)V(O)具有亚稳浅能级状态,解释了着色与导电性自相矛盾的共存现象。

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