Jung Yeon Sik, Ross C A
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.
Nano Lett. 2007 Jul;7(7):2046-50. doi: 10.1021/nl070924l. Epub 2007 Jun 15.
Templated self-assembly of a cylinder-forming poly(styrene-b-dimethylsiloxane) (PS-PDMS) diblock copolymer has been investigated for nanolithography applications. The large chi-parameter of the blocks and the use of a PDMS-brush substrate surface treatment are especially advantageous for achieving long-range ordering and minimizing defect densities, and the high Si content in PDMS leaves a robust oxide etch mask after two-step reactive ion etching. By adjusting mesa width and solvent-annealing vapor pressure and time, the cylinders can be intentionally oriented parallel or perpendicular to the trench walls. Pattern transfer into thin silica is also demonstrated. This block copolymer system has excellent characteristics for self-assembled nanolithography applications.
用于纳米光刻应用的圆柱状聚（苯乙烯 - b - 二甲基硅氧烷）（PS - PDMS）二嵌段共聚物的模板自组装已得到研究。嵌段的大χ参数以及PDMS刷基底表面处理的使用对于实现长程有序和最小化缺陷密度特别有利，并且PDMS中的高硅含量在两步反应离子蚀刻后留下坚固的氧化物蚀刻掩膜。通过调整台面宽度、溶剂退火蒸气压和时间，可以使圆柱有意地平行或垂直于沟槽壁取向。还展示了图案转移到薄二氧化硅中的过程。该嵌段共聚物体系对于自组装纳米光刻应用具有优异的特性。
