Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, USA.
Nano Lett. 2010 Mar 10;10(3):1000-5. doi: 10.1021/nl904141r.
The templated self-assembly of block copolymer (BCP) thin films can generate regular arrays of 10-50 nm scale features with good positional and orientational accuracy, but the ordering, registration and pattern transfer of sub-10-nm feature sizes is not well established. Here, we report solvent-annealing and templating methods that enable the formation of highly ordered grating patterns with a line width of 8 nm and period 17 nm from a self-assembled poly(styrene-b-dimethylsiloxane) (PS-PDMS) diblock copolymer. The BCP patterns can be registered hierarchically on a larger-period BCP pattern, which can potentially diversify the available pattern geometries and enables precise pattern registration at small feature sizes. Sub-10-nm-wide tungsten nanowires with excellent order and uniformity were fabricated from the self-assembled patterns using a reactive ion etching process.
嵌段共聚物（BCP）薄膜的模板自组装可以生成具有良好位置和取向精度的 10-50nm 尺度特征的规则排列，但亚 10nm 特征尺寸的有序化、配准和图案转移尚未得到很好的建立。在这里，我们报告了溶剂退火和模板方法，可从自组装的聚苯乙烯-b-二甲基硅氧烷（PS-PDMS）嵌段共聚物形成具有 8nm 线宽和 17nm 周期的高度有序的光栅图案。BCP 图案可以在较大周期 BCP 图案上进行分级配准，这可能使可用的图案几何形状多样化，并实现小特征尺寸的精确图案配准。使用反应离子刻蚀工艺，从自组装图案中制造出具有优异的有序性和均匀性的亚 10nm 宽钨纳米线。
