Bozzolo N, Gerspach F, Sawina G, Wagner F
Laboratoire d'Etude des Textures et d'Application des Matériaux, UMR CNRS 7078, Université Paul Verlaine - Metz, Ile du Saulcy, F-57012 Metz, France.
J Microsc. 2007 Sep;227(Pt 3):275-83. doi: 10.1111/j.1365-2818.2007.01811.x.
The question of the statistical accuracy of EBSD data for global texture calculation was re-explored on the basis of a very large grain population (83 000 grains measured on a recrystallized low-alloyed Zr sheet). Previous works aimed mainly at identifying and quantifying the main texture components and were based on much smaller data sets. The present work attempts to quantify the accuracy of the complete texture, including low-density regions of the orientation space. For that purpose, a new statistical parameter, V(Delta), based on the calculation of texture difference functions is proposed. This parameter has two main advantages: it is equally sensitive to both high and low peaks of the orientation density function (ODF), and it has a physical interpretation because it is the material volume fraction corresponding to the difference between a given ODF and a reference ODF (considered, or known to be close to the truth). Two main variables were studied: the number of grains taken into account and the peak width phi(0) of Bunge's 'Gaussian' model density used as kernel for the actual analysis. The orientation distribution functions were computed by nonparametric kernel density estimation with harmonics up to the order of 34. Minimizing the value of V(Delta) serves as the objective function for optimizing the peak width phi(0) as a function of the number of grains. The properties of the V(Delta) parameter also allows for the definition of a method for estimating the accuracy of a given texture that has been obtained from a limited number of grains, without knowing the true texture of the investigated material.
基于非常大的晶粒群体(在再结晶的低合金Zr板材上测量了83000个晶粒),重新探讨了用于全局织构计算的电子背散射衍射(EBSD)数据的统计准确性问题。先前的工作主要旨在识别和量化主要的织构组分,并且基于小得多的数据集。当前的工作试图量化完整织构的准确性,包括取向空间的低密度区域。为此,提出了一种基于织构差异函数计算的新统计参数V(Δ)。该参数有两个主要优点:它对取向密度函数(ODF)的高、低峰值同样敏感,并且它具有物理解释,因为它是对应于给定ODF与参考ODF(认为或已知接近真实情况)之间差异的材料体积分数。研究了两个主要变量:所考虑的晶粒数量以及用作实际分析内核的Bunge“高斯”模型密度的峰宽φ(0)。通过非参数核密度估计计算取向分布函数,谐波最高到34阶。最小化V(Δ)的值用作优化峰宽φ(0)作为晶粒数量函数的目标函数。V(Δ)参数的特性还允许定义一种方法,用于估计从有限数量的晶粒获得的给定织构精度,而无需知道被研究材料的真实织构。