Lohmüller Theobald, Helgert Michael, Sundermann Michael, Brunner Robert, Spatz Joachim P
Max Planck Institute for Metals Research, Department of New Materials and Biosystems & University of Heidelberg, Department of Biophysical Chemistry, Heisenbergstrasse 3, D-70569 Stuttgart, Germany.
Nano Lett. 2008 May;8(5):1429-33. doi: 10.1021/nl080330y. Epub 2008 Apr 16.
We report an innovative approach for the fabrication of highly light transmissive, antireflective optical interfaces. This is possible due to the discovery that metallic nanoparticles may be used as a lithographic mask to etch nonstraightforward structures into fused silica, which results in a quasihexagonal pattern of hollow, pillar-like protuberances. The far reaching optical performance of these structures is demonstrated by reflection and transmission measurements at oblique angles of incidence over a broad spectral region ranging from deep-ultraviolet to infrared light.
我们报告了一种用于制造高透光率、抗反射光学界面的创新方法。这一方法之所以可行,是因为发现金属纳米颗粒可用作光刻掩膜,将复杂结构蚀刻到熔融石英中,从而形成一种由中空柱状突起组成的准六边形图案。通过在从深紫外光到红外光的宽光谱区域内,对斜入射角下的反射和透射测量,证明了这些结构具有卓越的光学性能。