Kokhanchik L S
Institute of Microelectronics Technology and High Purity Materials RAS, Chernogolovka, Moscow region 142432, Russia.
Micron. 2009 Jan;40(1):41-5. doi: 10.1016/j.micron.2008.02.009. Epub 2008 Mar 10.
The different lithium niobate crystals with opposite domain structure (ODLN) were studied in the SEM using e-beam negative surface charging. In the ODLN the polarization vector Ps alternates periodically "tail-to-tail" and "head-to-head" and arranges perpendicular to the domain boundaries. In the investigation we have used congruent LiNbO(3) crystals (CLN) and Cr(2)O(3)- and In(2)O(3)-doped LN with the ODLN structure. Initial surface potential images in secondary electron (SE) mode and charge accumulation on the Y-cut surfaces of different LiNbO(3) crystals were compared. The initial surface potential relief in ODLN was found to depend on the position of "tail-to-tail" and "head-to-head" domain walls in the structure. In the doped LN with the periodical domain structure formed during the growth process, the surface potential changes near the domain walls are much weaker than in the structures of CLN obtained by the aftergrowth thermoelectrical treatment technique. A well-defined SE image of "tail-to-tail" domain walls was observed upon special surface negative charging in all types of investigated LN crystals. The negative surface charging in the "tail-to-tail" domain wall areas proceeded slower and the SE exit from these areas decreased as compared to other crystal areas. The charging conditions for the domain wall observation in all samples were comparatively analyzed. The width and uniformity along the boundary images were different and correlated with doping in the crystals. The formation of different charge images could be explained by a variety of positive point defect distributions near the "tail-to-tail" domain walls in different LN crystals. The defects and doping ions screen polarization charges in the "tail-to-tail" wall area and can influence recombination rates of charges induced by an electron beam. Therefore, these domain wall areas are charged much weaker at negative surface charging than other domain areas. This SEM approach could afford a possibility to compare the distribution of the defects that screen the polarization charges and accumulate near the ferroelectric domain wall areas in LN crystals.
利用电子束负表面充电技术,在扫描电子显微镜(SEM)中对具有相反畴结构(ODLN)的不同铌酸锂晶体进行了研究。在ODLN中,极化矢量Ps以“尾对尾”和“头对头”的方式周期性交替,并垂直于畴边界排列。在研究中,我们使用了同成分铌酸锂(CLN)晶体以及具有ODLN结构的Cr₂O₃和In₂O₃掺杂的铌酸锂晶体。比较了不同铌酸锂晶体在二次电子(SE)模式下的初始表面电位图像以及Y切割表面上的电荷积累情况。发现ODLN中的初始表面电位起伏取决于结构中“尾对尾”和“头对头”畴壁的位置。在生长过程中形成周期性畴结构的掺杂铌酸锂中,畴壁附近的表面电位变化比通过后续热电气处理技术获得的CLN结构中的变化要弱得多。在所有类型的研究铌酸锂晶体中,经过特殊表面负充电后,观察到了清晰的“尾对尾”畴壁的SE图像。与其他晶体区域相比,“尾对尾”畴壁区域的负表面充电进行得较慢,并且从这些区域出射的SE减少。对所有样品中畴壁观察的充电条件进行了比较分析。沿边界图像的宽度和均匀性不同,并且与晶体中的掺杂相关。不同电荷图像的形成可以通过不同铌酸锂晶体中“尾对尾”畴壁附近各种正点缺陷分布来解释。这些缺陷和掺杂离子在“尾对尾”壁区域屏蔽极化电荷,并可能影响电子束诱导电荷的复合率。因此,在负表面充电时,这些畴壁区域的充电比其他畴区域弱得多。这种SEM方法能够比较屏蔽极化电荷并在铌酸锂晶体铁电畴壁区域附近积累的缺陷的分布情况。