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Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation.

作者信息

Füchsel Kevin, Schulz Ulrike, Kaiser Norbert, Tünnermann Andreas

机构信息

Friedrich-Schiller-University, Institute of Applied Physics, Max-Wien-Platz 1, 07743 Jena, Germany.

出版信息

Appl Opt. 2008 May 1;47(13):C297-302. doi: 10.1364/ao.47.00c297.

DOI:10.1364/ao.47.00c297
PMID:18449263
Abstract

Coatings of transparent conductive oxides, especially indium tin oxide (ITO), are important in different fields. So far, application of these materials has been limited to substrates with high thermal stability. We describe an improved coating process for ITO based on plasma ion-assisted evaporation at a substrate temperature below 100 degrees C, which is suitable for organic substrates. In characterizing the thin films, we used the classical Drude theory to calculate the resistivity from optical film properties and compared the data with linear four-point measurements. X-ray diffraction spectroscopy was used to determine the structural properties of the thin films.

摘要

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