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使用相位恢复高分辨率透射电子显微镜对混合阳离子-阴离子III-V族半导体界面进行成分分析。

Compositional analysis of mixed-cation-anion III-V semiconductor interfaces using phase retrieval high-resolution transmission electron microscopy.

作者信息

Mahalingam K, Eyink K G, Brown G J, Dorsey D L, Kisielowski C F, Thust A

机构信息

Air Force Research Laboratory, Materials & Manufacturing Directorate, Wright-Patterson AFB, OH 45433-7707, USA.

出版信息

J Microsc. 2008 Jun;230(Pt 3):372-81. doi: 10.1111/j.1365-2818.2008.01995.x.

DOI:10.1111/j.1365-2818.2008.01995.x
PMID:18503662
Abstract

Employing exit-plane wave function (EPWF) reconstruction in high-resolution transmission electron microscopy (HRTEM), we have developed an approach to atomic scale compositional analysis of III-V semiconductor interfaces, especially suitable for analyzing quaternary heterostructures with intermixing in both cation and anion sub-lattices. Specifically, we use the focal-series reconstruction technique, which retrieves the complex-valued EPWF from a thru-focus series of HRTEM images. A study of interfaces in Al(0.4)Ga(0.6)As-GaAs and In(0.25)Ga(0.75)Sb-InAs heterostructures using focal-series reconstruction shows that change in chemical composition along individual atomic columns across an interface is discernible in the phase image of the reconstructed EPWF. To extract the interface composition profiles along the cation and anion sub-lattices, quantitative analysis of the phase image is performed using factorial analysis of correspondence. This enabled independent quantification of changes in the In-Ga and As-Sb contents across ultra-thin interfacial regions (approximately 0.6 nm wide) with true atomic resolution, in the In(0.25)Ga(0.75)Sb-InAs heterostructure. The validity of the method is demonstrated by analyzing simulated HRTEM images of an InAs-GaSb-InAs model structure with abrupt and graded interfaces. Our approach is general, permitting atomic-level compositional analysis of heterostructures with two species per sub-lattice, hitherto unfeasible with existing HRTEM methods.

摘要

在高分辨率透射电子显微镜(HRTEM)中采用出射平面波函数(EPWF)重建技术,我们开发了一种用于III-V族半导体界面原子尺度成分分析的方法,特别适用于分析阳离子和阴离子子晶格中均存在混合的四元异质结构。具体而言,我们使用焦系列重建技术,该技术从一系列通过聚焦的HRTEM图像中检索复数值的EPWF。使用焦系列重建对Al(0.4)Ga(0.6)As-GaAs和In(0.25)Ga(0.75)Sb-InAs异质结构中的界面进行研究表明,在重建的EPWF的相位图像中,可以辨别出沿界面单个原子列的化学成分变化。为了提取沿阳离子和阴离子子晶格的界面成分分布,使用对应因子分析对相位图像进行定量分析。这使得能够在In(0.25)Ga(0.75)Sb-InAs异质结构中,以真正的原子分辨率独立量化超薄界面区域(约0.6纳米宽)内In-Ga和As-Sb含量的变化。通过分析具有突变和渐变界面的InAs-GaSb-InAs模型结构的模拟HRTEM图像,证明了该方法的有效性。我们的方法具有通用性,允许对每个子晶格中有两种元素的异质结构进行原子级成分分析,这是现有HRTEM方法迄今无法实现的。

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