Baram M, Kaplan W D
Department of Materials Engineering, Technion - Israel Institute of Technology, Haifa 32000, Israel.
J Microsc. 2008 Dec;232(3):395-405. doi: 10.1111/j.1365-2818.2008.02134.x.
The preparation of good transmission electron microscopy specimens with minimum milling damage can be very complicated, especially from a specific area in a sample. Therefore, a novel approach for transmission electron microscopy specimen preparation using a focused ion beam system is proposed, based on the use of low energy (5 kV)Ga ions and a low incident ion angle (approximately 1 degree ) from a thickness of approximately 500 nm until the sample is electron transparent. Transmission electron microscopy specimens prepared by this method have significantly less irradiation damage, demonstrated by successful quantitative high-resolution transmission electron microscopy conducted on sapphire from data acquired using an aberration-corrected field emission gun transmission electron microscopy. Quantitative analysis was conducted by iterative digital image matching. The accuracy and sensitivity of the matching process is discussed.
制备具有最小研磨损伤的良好透射电子显微镜标本可能非常复杂，特别是从样品中的特定区域制备时。因此，提出了一种基于聚焦离子束系统的透射电子显微镜标本制备新方法，该方法使用低能量（5 kV）的镓离子和低入射角（约1度），从约500 nm的厚度开始，直至样品对电子透明。通过这种方法制备的透射电子显微镜标本具有明显更少的辐照损伤，这通过使用像差校正场发射枪透射电子显微镜采集的数据对蓝宝石进行的成功定量高分辨率透射电子显微镜分析得到证明。通过迭代数字图像匹配进行定量分析。讨论了匹配过程的准确性和灵敏度。
