Stolyarova E, Stolyarov D, Bolotin K, Ryu S, Liu L, Rim K T, Klima M, Hybertsen M, Pogorelsky I, Pavlishin I, Kusche K, Hone J, Kim P, Stormer H L, Yakimenko V, Flynn G
Department of Chemistry and Nanoscale Science and Engineering Center, Columbia University, New York, New York 10027, USA.
Nano Lett. 2009 Jan;9(1):332-7. doi: 10.1021/nl803087x.
Mechanically exfoliated graphene mounted on a SiO2/Si substrate was subjected to HF/H(2)O etching or irradiation by energetic protons. In both cases gas was released from the SiO2 and accumulated at the graphene/SiO2 interface resulting in the formation of "bubbles" in the graphene sheet. Formation of these "bubbles" demonstrates the robust nature of single layer graphene membranes, which are capable of containing mesoscopic volumes of gas. In addition, effective mass transport at the graphene/SiO2 interface has been observed.
安装在SiO₂/Si衬底上的机械剥离石墨烯受到HF/H₂O蚀刻或高能质子辐照。在这两种情况下,气体都从SiO₂中释放出来并积聚在石墨烯/SiO₂界面处,导致在石墨烯片中形成“气泡”。这些“气泡”的形成证明了单层石墨烯膜的坚固性质,它能够容纳介观体积的气体。此外,还观察到了石墨烯/SiO₂界面处有效的质量传输。