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400纳米、420纳米和435.8纳米辐射对培养的人视网膜色素上皮细胞的影响。

Effects of 400 nm, 420 nm, and 435.8 nm radiations on cultured human retinal pigment epithelial cells.

作者信息

Youn Hyun-Yi, Chou B Ralph, Cullen Anthony P, Sivak Jacob G

机构信息

School of Optometry, University of Waterloo, 200 University Avenue West, Waterloo, Ontario, Canada N2L 3G1.

出版信息

J Photochem Photobiol B. 2009 Apr 2;95(1):64-70. doi: 10.1016/j.jphotobiol.2009.01.001. Epub 2009 Jan 10.

Abstract

The present study demonstrates narrowband short-wavelengths radiation- (400, 420, and 435.8 nm) induced cellular damage of cultured human retinal pigment epithelial cells using in vitro biological assays to determine wavelengths that are responsible for photochemical lesions of the retina. This work involved the exposure of retinal pigment epithelial (RPE) cells (ARPE-19) to narrowband light of three different wavelengths (400, 420, and 435.8 nm) using a xenon arc lamp and interference filters. Cellular viability, mitochondrial distribution, and nucleic acid (both DNA and RNA) damage were quantified after various energy levels of exposure, using the Alamar blue assay, and confocal laser scanning microscopy with two fluorescent stains (Rhodamine 123 and Acridine Orange). The results clearly show that 400 nm light radiation can cause significant dose-dependent decreases in RPE cell viability as well as degradations of DNA/RNA and mitochondria in RPE cells, while 420 and 435.8 nm light radiation cause no cellular damage. While further evaluations may be needed to assess specificity and confounding factors of these assessment tools, the results may be a matter for consideration in future IOL design efforts.

摘要

本研究利用体外生物学检测方法,证明了窄带短波长辐射(400、420和435.8纳米)对培养的人视网膜色素上皮细胞造成的细胞损伤,以确定导致视网膜光化学损伤的波长。这项工作包括使用氙弧灯和干涉滤光片,将视网膜色素上皮(RPE)细胞(ARPE-19)暴露于三种不同波长(400、420和435.8纳米)的窄带光下。在不同能量水平的暴露后,使用alamar蓝检测法以及配备两种荧光染料(罗丹明123和吖啶橙)的共聚焦激光扫描显微镜,对细胞活力、线粒体分布和核酸(DNA和RNA)损伤进行了量化。结果清楚地表明,400纳米的光辐射可导致RPE细胞活力显著剂量依赖性下降,以及RPE细胞中DNA/RNA和线粒体的降解,而420和435.8纳米的光辐射则不会造成细胞损伤。虽然可能需要进一步评估这些评估工具的特异性和混杂因素,但这些结果可能是未来人工晶状体设计工作中需要考虑的问题。

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