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在光导向DNA阵列制备中控制寡核苷酸表面密度

Controlling oligonucleotide surface density in light-directed DNA array fabrication.

作者信息

Chen Siyuan, Phillips Margaret F, Cerrina Franco, Smith Lloyd M

机构信息

Department of Chemistry, University of Wisconsin-Madison, 1101 University Avenue, Madison, Wisconsin 53706, USA.

出版信息

Langmuir. 2009 Jun 2;25(11):6570-5. doi: 10.1021/la9000297.

Abstract

Over the past two decades high-density DNA arrays have developed into a central technology for nucleic acid analyses. Important application areas include whole-genome gene expression studies, high throughput analyses of single nucleotide polymorphisms, and, most recently, the determination of binding site specificities for transcription factors and other critical elements involved in gene regulation. A key parameter in the performance of DNA arrays is the density of the surface-bound oligonucleotides, which strongly affects both thermodynamic and kinetic aspects of DNA hybridization. In this report, we describe an approach for the control of oligonucleotide density in photolithographically fabricated DNA arrays, based upon a controlled UV light deprotection procedure. Modulation of the UV exposure permits a desired degree of deprotection of surface synthesis sites; a subsequent capping reaction to inactivate the exposed sites leaves only a desired fraction of active sites remaining for synthesis, corresponding to a lower oligonucleotide density. It is shown that the procedure is reasonably general, in that it is readily transferable to alternative substrate materials with similar results.

摘要

在过去二十年中,高密度DNA阵列已发展成为核酸分析的核心技术。重要的应用领域包括全基因组基因表达研究、单核苷酸多态性的高通量分析,以及最近转录因子和基因调控中其他关键元件结合位点特异性的测定。DNA阵列性能的一个关键参数是表面结合寡核苷酸的密度,它对DNA杂交的热力学和动力学方面都有强烈影响。在本报告中,我们描述了一种基于可控紫外光脱保护程序来控制光刻制造的DNA阵列中寡核苷酸密度的方法。紫外光照射的调节允许对表面合成位点进行所需程度的脱保护;随后进行封端反应使暴露的位点失活,仅留下所需比例的活性位点用于合成,这对应于较低的寡核苷酸密度。结果表明,该方法具有相当的通用性,因为它很容易转移到其他具有类似结果的底物材料上。

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