Bong Ki Wan, Pregibon Daniel C, Doyle Patrick S
Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA.
Lab Chip. 2009 Apr 7;9(7):863-6. doi: 10.1039/b821930c. Epub 2009 Feb 13.
We present a method called "Lock Release Lithography (LRL)" that utilizes a combination of channel topography, mask design, and pressure-induced channel deformation to form and release particles in a cycled fashion. This technique provides a means for the high-throughput production of particles with complex 3D morphologies and composite particles with spatially configurable chemistries. In this work, we demonstrate a diverse set of functional particles including those displaying heterogeneous swelling characteristics and containing functional entities such as nucleic acids, proteins and beads.
我们提出了一种名为“锁释放光刻法（LRL）”的方法，该方法利用通道形貌、掩膜设计和压力诱导的通道变形的组合，以循环方式形成和释放颗粒。这项技术为高通量生产具有复杂三维形态的颗粒以及具有空间可配置化学组成的复合颗粒提供了一种手段。在这项工作中，我们展示了各种各样的功能颗粒，包括那些表现出非均相溶胀特性并含有核酸、蛋白质和珠子等功能实体的颗粒。
