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Intraoperative retinal light damage reflected in electrophysiologic data.

作者信息

Lessel M, Thaler A, Heilig P, Jantsch W, Scheiber V

机构信息

Department of Ophthalmology, University of Vienna, Austria.

出版信息

Doc Ophthalmol. 1991;76(4):323-33. doi: 10.1007/BF00142670.

DOI:10.1007/BF00142670
PMID:1935540
Abstract

In a series of 30 unilaterally pseudophakic patients, electroretinograms and electrooculograms were recorded 6 months postoperatively. The unoperated on fellow eyes served as controls. High intraoperative retinal light exposure (3.4-7.3 mW/cm2, Zeiss OPMI6 operating microscope) caused a substantial reduction of electrophysiologic potentials. Light protection prevented deterioration of electroretinogram and electro-oculogram potentials; reducing the bulb voltage, tilting the axis of illumination, filtering short wavelengths and the use of light shields resulted in 4-log-unit lower intensities (0.8-3.7 microW/cm2).

摘要

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本文引用的文献

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Light-induced maculopathy from the operating microscope in extracapsular cataract extraction and intraocular lens implantation.
Ophthalmology. 1983 Aug;90(8):945-51. doi: 10.1016/s0161-6420(83)80022-0.
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Photic retinopathy from the operating room microscope.手术室显微镜导致的光性视网膜病变。
Am J Ophthalmol. 1986 May 15;101(5):561-9. doi: 10.1016/0002-9394(86)90946-3.
6
Three cases with light-induced retinopathy.三例光诱导性视网膜病变。
Doc Ophthalmol. 1988 May;69(1):11-8. doi: 10.1007/BF00154414.