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Intraoperative retinal light damage reflected in electrophysiologic data.

作者信息

Lessel M, Thaler A, Heilig P, Jantsch W, Scheiber V

机构信息

Department of Ophthalmology, University of Vienna, Austria.

出版信息

Doc Ophthalmol. 1991;76(4):323-33. doi: 10.1007/BF00142670.

Abstract

In a series of 30 unilaterally pseudophakic patients, electroretinograms and electrooculograms were recorded 6 months postoperatively. The unoperated on fellow eyes served as controls. High intraoperative retinal light exposure (3.4-7.3 mW/cm2, Zeiss OPMI6 operating microscope) caused a substantial reduction of electrophysiologic potentials. Light protection prevented deterioration of electroretinogram and electro-oculogram potentials; reducing the bulb voltage, tilting the axis of illumination, filtering short wavelengths and the use of light shields resulted in 4-log-unit lower intensities (0.8-3.7 microW/cm2).

摘要

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