Neauport J, Lamaignere L, Bercegol H, Pilon F, Birolleau J-C
Opt Express. 2005 Dec 12;13(25):10163-71. doi: 10.1364/opex.13.010163.
In this paper we study the effect of contamination induced by fabrication process on laser damage density of fused silica polished parts at 351 nm in nanosecond regime. We show, owing to recent developments of our raster scan metrology, that a good correlation exists between damage density and concentration of certain contaminants for the considered parts.
在本文中，我们研究了制造过程中产生的污染对纳秒级351nm波长下熔融石英抛光部件激光损伤密度的影响。我们表明，由于我们的光栅扫描计量技术的最新进展，对于所考虑的部件，损伤密度与某些污染物的浓度之间存在良好的相关性。
