Chalupský J, Juha L, Kuba J, Cihelka J, Hájková V, Koptyaev S, Krása J, Velyhan A, Bergh M, Caleman C, Hajdu J, Bionta R M, Chapman H, Hau-Riege S P, London R A, Jurek M, Krzywinski J, Nietubyc R, Pelka J B, Sobierajski R, Meyer-Ter-Vehn J, Tronnier A, Sokolowski-Tinten K, Stojanovic N, Tiedtke K, Toleikis S, Tschentscher T, Wabnitz H, Zastrau U
Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
Opt Express. 2007 May 14;15(10):6036-43. doi: 10.1364/oe.15.006036.
A linear accelerator based source of coherent radiation, FLASH (Free-electron LASer in Hamburg) provides ultra-intense femtosecond radiation pulses at wavelengths from the extreme ultraviolet (XUV; lambda<100nm) to the soft X-ray (SXR; lambda<30nm) spectral regions. 25-fs pulses of 32-nm FLASH radiation were used to determine the ablation parameters of PMMA - poly (methyl methacrylate). Under these irradiation conditions the attenuation length and ablation threshold were found to be (56.9+/-7.5) nm and approximately 2 mJ*cm(-2), respectively. For a second wavelength of 21.7 nm, the PMMA ablation was utilized to image the transverse intensity distribution within the focused beam at mum resolution by a method developed here.
基于直线加速器的相干辐射源FLASH(汉堡自由电子激光),能在从极紫外(XUV;波长<100nm)到软X射线(SXR;波长<30nm)的光谱区域提供超强飞秒辐射脉冲。利用32nm的FLASH辐射的25飞秒脉冲来确定聚甲基丙烯酸甲酯(PMMA)的烧蚀参数。在这些辐照条件下,衰减长度和烧蚀阈值分别为(56.9±7.5)nm和约2mJ·cm⁻²。对于21.7nm的第二个波长,通过这里开发的一种方法,利用PMMA烧蚀以微米分辨率对聚焦光束内的横向强度分布进行成像。