Xiang Rong, Wu Tianzhun, Einarsson Erik, Suzuki Yuji, Murakami Yoichi, Shiomi Junichiro, Maruyama Shigeo
Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan.
J Am Chem Soc. 2009 Aug 5;131(30):10344-5. doi: 10.1021/ja902904v.
In the liquid-based dip-coating, the hydrophilicity of a Si/SiO(2) substrate is found to be critical for the successful deposition of catalyst and hence the growth of single-walled carbon nanotubes (SWNTs). When the surface is functionalized by a self-assembled monolayer (SAM) and becomes hydrophobic, no catalyst remains and no SWNT grows. This concept can be utilized to localize the growth of SWNTs at designated regions where SAMs were selectively removed by, e.g., UV or electron beam. Patterned high-quality as-grown SWNTs with a potential line width of approximately 10 nm can be obtained.
在液基浸涂法中，发现Si/SiO₂衬底的亲水性对于催化剂的成功沉积以及单壁碳纳米管（SWNTs）的生长至关重要。当表面通过自组装单分子层（SAM）功能化并变得疏水时，没有催化剂残留，也没有SWNT生长。这一概念可用于将SWNTs的生长定位在通过例如紫外线或电子束选择性去除SAM的指定区域。可以获得具有约10nm潜在线宽的图案化高质量生长态SWNTs。
