通过电子束光刻制造的多级相位全息图。
Multilevel phase holograms manufactured by electron-beam lithography.
作者信息
Ekberg M, Larsson M, Hård S, Nilsson B
出版信息
Opt Lett. 1990 May 15;15(10):568-9. doi: 10.1364/ol.15.000568.
PMID:19768010
Abstract
Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to our knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to our knowledge, the highest reported to date.
摘要
据我们所知，首次报道了通过电子束光刻在一层抗蚀剂中制造的十级透射相位全息图（相息图）。对于所使用的两种抗蚀剂材料，测得的全息图衍射效率为70%。这相当于这些全息图最大理论值的82%，据我们所知，是迄今为止报道的最高值。
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