石英和光刻胶中的单光掩模、多级相息图：制造与评估。

Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluation.

作者信息

Andersson H, Ekberg M, Hård S, Jacobsson S, Larsson M, Nilsson T

出版信息

Appl Opt. 1990 Oct 1;29(28):4259-67. doi: 10.1364/AO.29.004259.

DOI:10.1364/AO.29.004259

PMID:20577374

Abstract

Kinoforms manufactured in photoresist by photolithographic techniques using a single, ten-level, grey scale photomask, exposed in a specially designed laser exposure system, are described. Kinoforms designed for uniform as well as for partial Gaussian beam illumination are discussed. The highest measured diffraction efficiency was 55%. Photoresist kinoforms were transferred into quartz substrates by reactive ion etching. The highest measured diffraction efficiency for the resulting all-quartz kinoforms was 53%.

摘要

介绍了通过光刻技术，使用单个十级灰度光掩模在光刻胶中制造的相息图，该相息图在专门设计的激光曝光系统中曝光。讨论了针对均匀以及部分高斯光束照明设计的相息图。测得的最高衍射效率为55%。通过反应离子蚀刻将光刻胶相息图转移到石英基板上。所得全石英相息图测得的最高衍射效率为53%。