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采用日蚀快门增强脉冲激光沉积法制备的掺BaTiO₃的Na₀.₅K₀.₅NbO₃薄膜。

BaTiO3 doped Na0.5K0.5NbO3 thin films deposited by using eclipse shutter enhanced pulsed laser deposition method.

作者信息

Choi J S, Hwang I R, Hong S H, Oh G T, Choi J A, Jeon S H, Kang S O, Yalishev Vadim Sh, Park B H, Choi Chang-Hak, Ahn Cheol-Woo, Nahm Sahn, Ahn Sang Jun

机构信息

Department of Physics, Konkuk University, Seoul 143-701, Korea.

出版信息

J Nanosci Nanotechnol. 2009 Dec;9(12):7354-8. doi: 10.1166/jnn.2009.1759.

Abstract

We have investigated structural, electrical, and electro-mechanical properties of lead-free piezoelectric BaTiO3 doped Na0.5K0.5NbO3 (BTO-NKN) thin films deposited by pulsed laser deposition (PLD) methods. BTO-NKN thin films have been deposited on La0.5Sr0.5CoO3 (LSCO) bottom electrodes with LaAlO3 (LAO) substrates. X-ray diffraction data have shown that all the BTO-NKN and bottom electrodes are highly oriented with their c-axes normal to the substrates. In order to improve the morphology of BTO-NKN thin films, we have located an eclipse shutter between a target and a substrate. Root-mean-square roughness was changed from 91 nm to 21 nm with eclipse shutter enhanced PLD (E-PLD) method. Furthermore, the enhanced surface morphology leads to the improvement in electrical or electro-mechanical properties mainly due to increased density. Typical capacitance and d33 values of a BTO-NKN film deposited by E-PLD method are 1000 pF and 30 pmN, respectively.

摘要

我们研究了通过脉冲激光沉积(PLD)方法制备的无铅压电BaTiO3掺杂Na0.5K0.5NbO3(BTO-NKN)薄膜的结构、电学和机电性能。BTO-NKN薄膜已沉积在具有LaAlO3(LAO)衬底的La0.5Sr0.5CoO3(LSCO)底部电极上。X射线衍射数据表明,所有BTO-NKN和底部电极的c轴均垂直于衬底高度取向。为了改善BTO-NKN薄膜的形貌,我们在靶材和衬底之间设置了一个遮光快门。采用带遮光快门增强型PLD(E-PLD)方法,均方根粗糙度从91nm变为21nm。此外,表面形貌的改善主要由于密度增加,从而导致电学或机电性能的提高。通过E-PLD方法制备的BTO-NKN薄膜的典型电容和d33值分别为1000pF和30pm/N。

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