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镁诱导高指数硅(5 5 12)表面的超结构变化:准一维结构的形成。

Magnesium induced superstructural changes in high index Si (5 5 12) surface: formation of quasi one dimensional structures.

作者信息

Kumar Mahesh, Shivaprasad S M

机构信息

Surface Physics and Nanostructures Group, National Physical Laboratory, New Delhi 110012, India.

出版信息

J Nanosci Nanotechnol. 2009 Sep;9(9):5637-41. doi: 10.1166/jnn.2009.1172.

DOI:10.1166/jnn.2009.1172
PMID:19928279
Abstract

This is the first report of the initial formation of Mg/Mg2Si/Si interface at room temperature on high index Si (5 5 12) surface. The work describes the initial Mg2Si formation on the silicon surface, which forms a silicide layer after a critical coverage, and then metallic magnesium forms on top of the Mg2Si layers. The studies have been performed in situ in ultra high vacuum conditions (5 x 10(-11) Torr) and analyzed by surface sensitive techniques like Auger electron spectroscopy, electron energy loss spectroscopy, and low energy electron diffraction. The Auger uptake curve obtained by AES, shows the layered growth of Mg while the LEED and EELS shows the formation of surface phases, which are identified as the quasi 1D structure, with different electronic natures indicated by EELS studies. The growth process occurs in the following way that firstly the adsorption of Mg reconstructs the Si (5 5 12)-2 x 1 surface and forms two stable phases-Si (337) and Si (113) below the coverage of 1 ML, while there is Mg2Si formation at the coverage of 1 ML, further increase in the coverage of magnesium results in the metallic magnesium on top of the Mg2Si layer. Thus, with the Mg adsorption at RT not only the Si (5 5 12)-2 x 1 surface is reconstructed to give the stable phases but it also demonstrates the formation of Mg2Si at RT, which is the interfacial layer in between metallic Mg and Si.

摘要

这是关于在高指数Si(5 5 12)表面室温下首次形成Mg/Mg2Si/Si界面的首份报告。该工作描述了硅表面初始Mg2Si的形成,在达到临界覆盖度后形成硅化物层,然后在Mg2Si层顶部形成金属镁。这些研究是在超高真空条件(5×10(-11)托)下原位进行的,并通过俄歇电子能谱、电子能量损失谱和低能电子衍射等表面敏感技术进行分析。通过俄歇电子能谱获得的俄歇吸收曲线显示了Mg的层状生长,而低能电子衍射和电子能量损失谱显示了表面相的形成,这些表面相被确定为准一维结构,电子能量损失谱研究表明其具有不同的电子性质。生长过程按以下方式发生:首先,Mg的吸附重构了Si(5 5 12)-2×1表面,并在覆盖度低于1 ML时形成两个稳定相——Si(337)和Si(113),而在覆盖度为1 ML时形成Mg2Si,镁覆盖度的进一步增加导致在Mg2Si层顶部形成金属镁。因此,在室温下Mg的吸附不仅重构了Si(5 5 12)-2×1表面以产生稳定相,还证明了在室温下形成Mg2Si,它是金属Mg和Si之间的界面层。

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