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Y 接触高性能 n 型单壁碳纳米管场效应晶体管:与 Sc 接触器件的缩放比较。

Y-contacted high-performance n-type single-walled carbon nanotube field-effect transistors: scaling and comparison with Sc-contacted devices.

机构信息

Department of Electronics, Key Laboratory for the Physics and Chemistry of Nanodevices, Peking University, Beijing 100871, China.

出版信息

Nano Lett. 2009 Dec;9(12):4209-14. doi: 10.1021/nl9024243.

Abstract

While it has been shown that scandium (Sc) can be used for making high-quality Ohmic contact to the conduction band of a carbon nanotube (CNT) and thus for fabricating high-performance n-type CNT field effect transistors (FETs), the cost for metal Sc is currently five times more expensive than that for gold and one thousand times more expensive than for yttrium (Y) which in many ways resembles Sc. In this Letter we show that near perfect contacts can be fabricated on single-walled CNTs (SWCNTs) using Y, and the Y-contacted CNT FETs outperform the Sc-contacted CNT FETs in many important aspects. Low-temperature measurements on Y-contacted devices reveal that linear output characteristics persist down to 4.3 K, suggesting that Y makes a perfect Ohmic contact with the conduction band of the CNT. Self-aligned top-gate devices have been fabricated, showing high performance approaching the theoretical limit of CNT-based devices. In particular a room temperature conductance of about 0.55G(0) (with G(0) = 4e(2)/h being the quantum conductance limit of the SWCNT), threshold swing of 73 mV/decade, electron mobility of 5100 cm(2)/V.s, and mean free length of up to 0.639 mum have been achieved. Gate length scaling behavior of the Y-contacted CNT FETs is also investigated, revealing a more favorable energy consumption and faster intrinsic speed scaling than that of the Si-based devices.

摘要

虽然已经证明钪(Sc)可用于与碳纳米管(CNT)的导带形成高质量的欧姆接触,从而制造高性能 n 型 CNT 场效应晶体管(FET),但金属 Sc 的成本目前比金贵五倍,比在许多方面与 Sc 相似的钇(Y)贵一千倍。在这封信中,我们表明使用 Y 可以在单壁 CNT(SWCNT)上制造近乎完美的接触,并且 Y 接触的 CNT FET 在许多重要方面优于 Sc 接触的 CNT FET。低温测量表明,Y 接触器件的线性输出特性一直持续到 4.3 K,这表明 Y 与 CNT 的导带形成了完美的欧姆接触。已经制造了自对准顶栅器件,表现出接近 CNT 器件理论极限的高性能。特别是,室温下的电导率约为 0.55G(0)(其中 G(0) = 4e(2)/h 是 SWCNT 的量子电导极限),阈值摆动为 73 mV/decade,电子迁移率为 5100 cm(2)/V.s,平均自由长度可达 0.639 µm。还研究了 Y 接触 CNT FET 的栅长缩放行为,发现与 Si 基器件相比,其能量消耗更有利,固有速度缩放更快。

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