通过直接微图案化 SU-8 光致抗蚀剂纳米纤维的静电纺丝垫制造的多尺度碳结构。

Multiscale carbon structures fabricated by direct micropatterning of electrospun mats of SU-8 photoresist nanofibers.

机构信息

Department of Chemical Engineering and DST Unit on Nanosciences, Indian Institute of Technology, Kanpur-208016, UP, India.

出版信息

Langmuir. 2010 Feb 16;26(4):2218-22. doi: 10.1021/la904078r.

DOI:10.1021/la904078r

PMID:20070083

Abstract

A novel method for the direct fabrication of arrays of micropatterned polymeric and carbon nanofiber structures on any substrate is developed. First SU-8, an epoxy-based negative photoresist, is electrospun under optimized conditions to produce a layer of polymeric nanofibers. Next, this nanofibrous mat is micropatterned using photolithography, and finally, pyrolysis produces ordered arrays of microdomains containing carbon nanofibers. The nanotextured surfaces of carbon nanofibers are shown to be very hydrophobic (water contact angle approximately 130 degrees). Micropatterning thus generates a substantial wettability contrast of nanofiber domains with intervening micropatches of very hydrophilic carbon (approximately 20 degrees) or silicon substrates.

摘要

开发了一种在任何基底上直接制造微图案化聚合物和碳纳米纤维结构阵列的新方法。首先，在优化条件下电纺丝 SU-8（一种基于环氧树脂的负性光致抗蚀剂）以产生聚合物纳米纤维层。接下来，使用光刻技术对该纳米纤维垫进行微图案化，最后，热解产生包含碳纳米纤维的有序微域阵列。结果表明，碳纳米纤维的纳米纹理表面具有非常疏水性（水接触角约为 130 度）。因此，微图案化会产生纳米纤维域与非常亲水的碳（约 20 度）或硅基底的微斑之间的显著润湿性对比。