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用于集成光学的离子轰击熔凝石英的特性

Properties of ion-bombarded fused quartz for integrated optics.

作者信息

Standley R D, Gibson W M, Rodgers J W

出版信息

Appl Opt. 1972 Jun 1;11(6):1313-6. doi: 10.1364/AO.11.001313.

DOI:10.1364/AO.11.001313
PMID:20119140
Abstract

Development of techniques for production of carefully controlled, low-loss optical waveguides in solid dielectric materials is essential to development of integrated optical circuits for signal processing in future optical communications systems. Ion implantation offers an attractive possibility because of the refractive index and film thickness control possible by this technique. To evaluate this possibility we have investigated some of the optical properties of ion-bombarded fused quartz. A variety of ions ranging from helium ions to bismuth ions has been used. We have concentrated on refractive index and optical loss variations (on those implants into which a beam could be launched) as effected by (1) ion species and dose, (2) surface preparation, (3) surface temperature during bombardment, and (4) postbombardment annealing. This paper does not attempt to give an inclusive account of all the results obtained but principally discusses the best results so far, which are those using lithium ions. For lithium ion bombardment we have observed approximately linear variation of refractive index at 6328 A with dose n = n(0) + 2.1 x 10(-21)C, where n(0) is the prebombardment value (= 1.458 for fused quartz), and C is the ion concentration in ions/cm(3) (C < 2.2 x 10(19)). The optical absorption decreases significantly with increase in substrate temperature during implantation, and losses less than 0.2 dB/cm have been achieved. The refractive index change appears to be primarily due to disorder produced by the incident particles rather than a chemical doping effect as evidenced by postbombardment annealing studies.

摘要

开发在固体介电材料中制造精确控制、低损耗光波导的技术对于未来光通信系统中用于信号处理的集成光路的发展至关重要。离子注入提供了一种有吸引力的可能性,因为通过该技术可以控制折射率和薄膜厚度。为了评估这种可能性,我们研究了离子轰击熔凝石英的一些光学特性。使用了从氦离子到铋离子等多种离子。我们专注于折射率和光损耗变化(对于那些可以发射光束的注入),这些变化受以下因素影响:(1)离子种类和剂量,(2)表面处理,(3)轰击期间的表面温度,以及(4)轰击后退火。本文并不试图全面介绍所有获得的结果,而是主要讨论迄今为止的最佳结果,即使用锂离子的结果。对于锂离子轰击,我们观察到在6328埃处折射率随剂量n = n(0) + 2.1 x 10(-21)C近似呈线性变化,其中n(0)是轰击前的值(对于熔凝石英,n(0)=1.458),C是以离子/cm(3)为单位的离子浓度(C < 2.2 x 10(19))。光吸收随着注入期间衬底温度的升高而显著降低,并且已经实现了小于0.2 dB/cm的损耗。轰击后退火研究表明,折射率变化似乎主要是由于入射粒子产生的无序,而不是化学掺杂效应。

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