Rand M J, Standley R D
Appl Opt. 1972 Nov 1;11(11):2482-8. doi: 10.1364/AO.11.002482.
We have evaluated chemical vapor-deposited silicon oxynitride films on fused silica as a potential integrated optics medium. Refractive index of these glassy films depends on composition, which is adjusted by controlling the ratio of the nitric oxide and silane reactants. Films of n = 1.48-1.54 had losses <0.4 dB/cm at 633 nm. The preparation of the fused silica substrate surface and other precautions to minimize scattering centers ape discussed.
我们评估了在熔融石英上化学气相沉积的氮氧化硅薄膜作为一种潜在的集成光学介质。这些玻璃状薄膜的折射率取决于成分，通过控制一氧化氮和硅烷反应物的比例来进行调整。折射率为1.48 - 1.54的薄膜在633纳米波长处的损耗小于0.4分贝/厘米。文中讨论了熔融石英衬底表面的制备以及其他将散射中心降至最低的注意事项。
